Wafer bow sensitivity:  1 micron bow height change.

Wafer sizes 100, 150 or 200mm

Radii of curvature measurements 10 m – 1500 m*)

Repeatability 1.0% (1 sigma) of average value of radius of
curvature*)

Results Report Film Radius, Wafer Bow Height, Warp,
Substrate Thickness, Film Thickness, Date and Time

*) Repeatability specified for 750 um thick blanket wafer. For other wafers it may vary.
ZebraOptical Optoprofiler
Range from Focus
Small Splatter Metrology
(see images right, below)
Specification
Value
Wafer size
150 mm standard, other sizes
available as special feature
Z resolution
10-200 nm
(may vary depending on objective
and field of view selected)
XY resolution
500 nm
(may vary depending on objective
and field of view selected)
Wafer Stage
Motorized XY stage with stepper
motors and encoders, Piezo
driven Z stage.
Camera
5 MP CCD Monochrome camera
standard
Narrow Band Illumination
5 slot automated color wheel with
bandpass interference filters
available as special feature
Important Note: All product specifications are subject to change without notice. For up to date product specifications please
contact directly headquarters.
Sunrise Optical LLC (http://zebraoptical.com) has developed an optical roughness gauge
measurement of roughness in range Ra= 0.1 – 3.0 um.
Gauge is immune to mechanical vibrations and
stray light.

Z-Coordinate from Microscopy Defocus

This option transforms a standard microscope
to a tool for precise topography measurement
of rough or feature rich samples.

Samples are brought in and out of focus using a
precision piezo stage. The defocused images
are then analyzed using a proprietary algorithm
to recover the topography and roughness of the
sample.

The unit is sold as an attachment to the
standard ZebraOptical Microscope system.

Technology is similar to that presented in the
Small Splatter metrology tool in our standard
brochure.

Limitations:
This system is limited to samples
which have feature rich surfaces, for which the
system can measure and analyze defocused
imaged.
System is not suitable for the
measurement of smooth surfaces.

Field of view: ~100 um x 80 um
Depth of field: 0.18 um
Z resolution 0.1 um
Piezo Resolution: 0.03 um


The system is comprised of the Standard
ZebraOptical Microscopy system, the range
from defocus attachment, a control box
(similar to that pictured above), and a PC
including the image processing software.

Recovered sample topography using small
sample metrology system. The accuracy and
reproducibility depends on type of objective
used.

Principle of Operation:
A precision stage varies the z-position of the sample
to produce both focused and blurred images.
Top: Standard Nomarsky Microscope
Bottom: Sample images brought into and out of
focus
System was used to analyze the topography of the
reverse side of a US cent.
Roughness and Surface Properties:
Surface topography calculated using the Z-
calculate various surface parameters, including:
Flatness
Curvature
Roughness Parameters
Ra (arithmetic average)
RMS (root mean squared)
Rv (maximum valley depth)
Rp (maximum peak height)
Rt (maximum profile height)
Rsk (skew)
Rku (kurtosis)

Contact info@zebraoptical.com to learn more about this option.